Is the Ne operation of the helium ion microscope suitable for electron backscatter diffraction sample preparation?

• Annalena Wolff

Beilstein J. Nanotechnol. 2021, 12, 965–983, doi:10.3762/bjnano.12.73

• , then the overall damage to the specimen is reduced. Keywords: electron backscatter diffraction (EBSD); Ga; helium ion microscope (HIM); ion polishing; Ne; Introduction The helium ion microscope (HIM) has sparked interest in many disciplines since its commercial release in the first decade of the 21st

• . Numerous sample preparation procedures exist to achieve the required mirror finish of the sample surface. Depending on the material, mechanical polishing [28], electropolishing [29], or ion polishing [30] are the key techniques. A thorough overview of the different EBSD preparation techniques can be found

• potentially lead to misinterpretation of the results, are unfortunately never published. Besides the initial study by Michael [34], which showed that Ga ion polishing can phase transform Cu to Cu3Ga as well as a follow up study investigating microtextural modifications in samples when using a Ga FIB [35], a

Correlative electrochemical strain and scanning electron microscopy for local characterization of the solid state electrolyte Li_1.3Al_0.3Ti_1.7(PO₄)₃

• Nino Schön,
• Deniz Cihan Gunduz,
• Shicheng Yu,
• Hermann Tempel,
• Roland Schierholz and
• Florian Hausen

Beilstein J. Nanotechnol. 2018, 9, 1564–1572, doi:10.3762/bjnano.9.148

• sample was rotated and tilted for perpendicular ion polishing. For this purpose again, a protective Pt-layer was deposited on the new cross-section before removing the initially deposited protective Pt-layer of 90 µm × 90 µm size as well as parts of the material beneath it, to form the ion-polished

Graphene-enhanced plasmonic nanohole arrays for environmental sensing in aqueous samples

• Christa Genslein,
• Peter Hausler,
• Eva-Maria Kirchner,
• Rudolf Bierl,
• Antje J. Baeumner and
• Thomas Hirsch

Beilstein J. Nanotechnol. 2016, 7, 1564–1573, doi:10.3762/bjnano.7.150

• of NSL with electrochemical deposition, ion-polishing, plasma treatment and glancing-angle deposition produces ordered nanohole arrays. Therefore, NSL is a promising tool to produce nanostructured substrates. Here, nanohole arrays were prepared by a modified nanosphere lithography (Figure 1). The